Computer-generated microcooled reflection holograms in silicon for material processing with a CO(2) laser

We report on the design, fabrication, and testing of multilevel computer-generated reflection holograms in Si for CO(2) laser material processing for laser intensities of <2 kW/cm(2). The holograms are designed with an iterative method based on scalar diffraction theory. In this case the reconstructed intensity distribution is independent of the incident high-power laser mode. For achieving high diffraction efficiencies, multilevel staircase surface topologies are fabricated by multimask and reactive ion-etching technology on the front side of a polished Si wafer. For efficient hologram cooling, a gratinglike structure of microchannels is chemically etched on the back side of the Si wafer. Absorption and deformation measurements have been carried out on both a microcooled flat mirror and a reflection hologram. The maximum deformation amounts to 200 nm and is 10 times smaller than comparable conventional uncoated Cu mirrors. A diffraction efficiency of 88% is achieved with an eight-level reflection hologram and a 30-mm-diameter CO(2) laser beam with a power of 5 kW.