Measurements of the phase shift on reflection for low-order infrared Fabry-Perot interferometer dielectric stack...

Area of Science:

• Optics and Photonics
• Interferometry
• Dielectric Metamaterials

Background:

• Fabry-Perot interferometers are crucial optical devices.
• Accurate characterization of mirror coatings is essential for device performance.
• Phase dispersion in dielectric stacks can limit low-order interferometer performance.

Purpose of the Study:

• To present a simple Fizeau interferometer technique for measuring absolute phase shift on reflection.
• To demonstrate a near-ideal low-order Fabry-Perot interferometer by minimizing phase dispersion.
• To highlight potential applications enabled by the improved interferometer.

Main Methods:

• Utilized a Fizeau interferometer setup to measure absolute phase shift on reflection.
• Fabricated and characterized dielectric stack mirrors for Fabry-Perot interferometers.
• Minimized phase dispersion in the dielectric stack to achieve near-ideal low-order performance.

Main Results:

• Achieved excellent agreement between measured and predicted phase shift on reflection.
• Demonstrated a low-order (1-10) Fabry-Perot interferometer with minimized phase dispersion.
• Showcased the potential for compact spectral imagers and tunable laser sources.

Conclusions:

• The Fizeau interferometer technique provides accurate phase shift measurements for dielectric mirrors.
• Near-ideal low-order Fabry-Perot interferometers can be realized by controlling phase dispersion.
• These advanced interferometers offer significant potential for various spectroscopic and laser applications.