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Updated: Jul 7, 2026
Growth and Electrostatic/chemical Properties of Metal/LaAlO3/SrTiO3 Heterostructures
Published on: February 8, 2018
The surface hydro-oxidation of LaNiO(3-delta) thin films
S Mickevicius1, S Grebinskij, V Bondarenka
1Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania. sigism@pfi.lt
Abstract:
The chemical structure and possible hydro-oxidation of LaNiO(3-delta) films were studied by means of tuneable high-energy X-ray photoelectron spectroscopy using synchrotron radiation. It was shown that the hydroxyl-containing phase, located near the film surface, may be attributed to the lanthanum and nickel hydroxide species. The thickness of a hydroxide-enriched layer was estimated from the oxide/hydroxide ratio measured at normal and grazing conditions. The hydroxide layer thickness was about 2 nm for step and/or exponential hydroxide spatial distribution.
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