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A Photonic System for Generating Unconditional Polarization-Entangled Photons Based on Multiple Quantum Interference

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Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure.

A G Poleshchuk¹, E G Churin, V P Koronkevich

¹Laboratory of Laser Technologies, Institute of Automation and Electrometry, Russian Academy of Sciences, Koptuga Prospekt 1, 630090 Novosibirsk, Russia. alexp@okibox.iae.nsk.su

|February 29, 2008

Summary

A new laser pattern generator offers a precise, resistless method for fabricating diffractive elements. This advanced system achieves high accuracy for continuous-relief and binary patterns, improving optical component manufacturing.

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Area of Science:

Optics and Photonics
Materials Science
Nanofabrication

Background:

Traditional laser/electron-beam writers face limitations in fabricating complex diffractive elements.
There is a need for advanced fabrication techniques for high-precision optical components.

Purpose of the Study:

To develop and demonstrate a precision laser pattern generator for arbitrary diffractive elements.
To establish resistless fabrication technologies for continuous-relief and binary patterns.
To evaluate the system's performance and accuracy using test structures and fabricated elements.

Main Methods:

Development of a novel precision laser pattern generator.
Implementation of two resistless writing technologies on chromium and amorphous silicon films.
Fabrication of concentric continuous-relief and arbitrary binary patterns with sub-micrometer feature sizes.
Investigation of limit characteristics using specialized test structures.

Main Results:

The system achieves minimum feature sizes below 0.6 micrometers and position accuracy of 0.1 micrometers over 300-mm substrates.
Demonstrated fabrication of a 58-mm f/1.1 zone plate with a lambda/50 root mean square (rms) wave-front error.
Achieved pattern accuracy of 0.06 micrometers for the fabricated zone plate.
Successfully presented several examples of fabricated diffractive elements.

Conclusions:

The developed laser pattern generator provides a viable, high-precision alternative to existing writing systems.
Resistless fabrication technologies on chromium and amorphous silicon enable efficient creation of complex diffractive optics.
The system's demonstrated accuracy and capability are suitable for advanced optical applications.