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Effect of fabrication errors in channel waveguide Bragg gratings
1Department of Electronic Engineering, University of Naples Federico II, Via Claudio 21, 80125 Naples, Italy.
Applied Optics
|February 29, 2008
Summary
This study analyzes nonideal Bragg gratings in rib waveguides, detailing how fabrication errors impact spectral performance. It introduces a new method to analyze real-world grating imperfections.
Area of Science:
- Photonics and Waveguide Optics
- Nanofabrication and Lithography
Background:
- Bragg gratings are crucial optical components in integrated photonics.
- Nonideal fabrication processes introduce errors affecting device performance.
Purpose of the Study:
- To analyze the spectral performance of nonideal rectangular Bragg gratings in rib waveguides.
- To investigate the impact of photolithography and etching errors on grating performance.
- To present a novel analytical approach for real gratings.
Main Methods:
- Multilayer approach utilizing the effective-index method.
- Analysis of photolithographic errors (period, shape) and etching depth errors.
- Investigation of stitching errors from electron-beam lithography.
- Extension of coupled-mode theory for real gratings.
Main Results:
- Fabrication errors significantly alter the spectral performance of Bragg gratings.
- Stitching errors in electron-beam lithography have a notable influence.
- The proposed analytical approach accurately models real grating behavior.
Conclusions:
- Understanding and modeling fabrication errors is essential for designing high-performance integrated photonic devices.
- The developed analytical method provides a valuable tool for analyzing nonideal Bragg gratings.
- This work contributes to the precise fabrication and optimization of photonic devices.
