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Published on: August 25, 2016
Investigation of rf power absorption in the plasma of helicon ion source
S Mordyk1, O Alexenko, V Miroshnichenko
1Institute of Applied Physics, NAS Ukraine, Sumy, Ukraine. mordyk@ipflab.sumy.ua
Abstract:
The simulations of the spatial distribution of rf power absorbed in a helicon ion source reveal a correlation between the depth of penetration of rf power into the plasma and the tilt angle of lines of force of the outer magnetic field. The deeper field penetration and greater power absorption were observed at large tilt angles of the field line to the plasma surface. The evaluations as to the possibility of excitation of helicon waves in compact rf ion sources were performed.
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