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Related Concept Videos

Types of Semiconductors01:20

Types of Semiconductors

Intrinsic semiconductors are highly pure materials with no impurities. At absolute zero, these semiconductors behave as perfect insulators because all the valence electrons are bound, and the conduction band is empty, disallowing electrical conduction. The Fermi level is a concept used to describe the probability of occupancy of energy levels by electrons at thermal equilibrium. In intrinsic semiconductors, the Fermi level is positioned at the midpoint of the energy gap at absolute zero. When...

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Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
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Published on: April 1, 2020

Interference coatings based on synthesized silicon nitride.

C C Lee1, H L Chen, J C Hsu

  • 1Institute of Optical Sciences, National Central University, Chung-Li 320, Taiwan. cclee@ios704.ios.ncu.edu.tw

Applied Optics
|March 6, 2008
PubMed
Summary

Amorphous silicon nitride (SiN(x)) films were synthesized for optical coatings. These strong films exhibit tunable refractive indices, enabling applications like antireflection coatings and bandpass filters.

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Area of Science:

  • Materials Science
  • Optical Engineering
  • Thin Film Technology

Background:

  • Silicon nitride (SiN(x)) is a crucial material in optical coatings due to its desirable properties.
  • Controlling the optical and mechanical characteristics of SiN(x) films is essential for advanced optical devices.

Purpose of the Study:

  • To synthesize amorphous silicon nitride (SiN(x)) films using ion-assisted deposition.
  • To investigate the tunability of refractive indices in SiN(x) films.
  • To demonstrate the application of these films in optical coatings.

Main Methods:

  • Ion-assisted deposition utilizing a single coating material and a nitrogen-ion beam source.
  • Characterization of film properties, including mechanical strength and refractive index.
  • Fabrication of multilayer optical coatings.

Main Results:

  • Amorphous SiN(x) films were successfully synthesized.
  • A wide range of refractive indices (1.72 to 3.43 at 1550 nm) was achieved.
  • The films demonstrated excellent mechanical strength.
  • Demonstrated near-infrared (near-IR) antireflection coatings and bandpass filters using SiN(x)/Si multilayers.

Conclusions:

  • Ion-assisted deposition offers a viable method for producing tunable, mechanically robust SiN(x) films.
  • The demonstrated optical coatings highlight the potential of SiN(x) in advanced photonic applications.
  • SiN(x) films are suitable for fabricating high-performance optical filters and antireflection layers.