Interferometric characterization of subwavelength lamellar gratings

We propose a new, to our knowledge, method for determining the two main critical parameters of periodic one-dimensional lamellar structures, namely, linewidths and etched depths. The method is simple and requires only two measurements for the phase of the zero-transmitted order under two orthogonal polarizations. It is inspired by the analogy between subwavelength gratings and anisotropic homogeneous thin films. The method is tested with experimental data obtained with a Mach-Zehnder interferometer. Etched depths and linewidths derived from the interferograms and electromagnetic theory are compared with scanning-electron-microscope observations.