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Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System
Published on: July 18, 2015
Diffraction gratings of photosensitive ZrO2 gel films fabricated with the two-ultraviolet-beam interference method
1Department of Optical Materials, Osaka National Research Institute, Agency of Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan. kintaka@onri.go.jp
Abstract:
Photosensitive ZrO(2) gel films were patterned with a two-beam interference method by use of a 325-nm-wavelength He-Cd laser for the first time to our knowledge. The ZrO(2) gel films were prepared from Zr(O-n-C(4)H(9))(4) chemically modified with benzoylacetone. We fabricated uniform gratings with a 0.5-microm period on Si or SiO(2) substrates by etching the gel films in ethyl alcohol after UV irradiation. A maximum diffraction efficiency of 28% was attained with the grating fabricated on Si substrate under a Littrow mounting condition by use of a 633-nm-wavelength He-Ne laser. Blazed gratings could also be fabricated.
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