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Modeling and observations of phase-mask trapezoidal profiles with grating-fiber image reproduction
D R Lyons1, J V Lindesay, H R Lee
1Research Center for Optical Physics, Hampton University, Hampton, Virginia 23668, USA. dlyons@netscape.net
Applied Optics
|March 14, 2008
Summary
Investigating phase masks for fiber Bragg gratings revealed design and fabrication defects causing nonuniformity. These issues impact grating performance, highlighting the need for precise manufacturing in optical fiber technology.
Area of Science:
- Optical engineering
- Materials science
Background:
- Phase masks are critical for fabricating fiber Bragg gratings.
- Defects in phase masks can lead to nonuniform grating formation.
- Understanding these defects is essential for improving optical fiber performance.
Purpose of the Study:
- To investigate trapezoidal design and fabrication defects in phase masks.
- To analyze the impact of these defects on interference patterns.
- To develop a theoretical model for phase mask analysis.
Main Methods:
- Direct visualization technique for interference pattern analysis.
- Comparison with two-beam interference patterns.
- Atomic Force Microscope (AFM) imaging of phase gratings.
- Development of a general theoretical model.
Main Results:
- Identified nonuniformity in interference patterns generated by phase masks.
- Correlated anomalous fringe patterns with specific phase mask defects.
- Determined input parameters for a theoretical model using AFM data.
- Investigated phase masks with pitches of 0.566 and 1.059 micrometers.
Conclusions:
- Phase mask defects significantly influence Bragg reflection grating quality.
- Precise characterization of phase masks is crucial for reliable optical fiber fabrication.
- The developed model aids in understanding and mitigating fabrication issues.
