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Updated: Jul 6, 2026

Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films
Published on: December 4, 2014
Defect formation in hafnium dioxide thin films
D Reicher1, P Black, K Jungling
1Optical Coating and Component Evaluation Laboratory, S. Systems Corporation, PO Box 9316, Albuquerque, New Mexico 87119, USA. reicherd@plk.af.mil
Abstract:
Hafnium dioxide thin films were deposited by reactive electron-beam evaporation at six different substrate temperatures on fused-silica substrates. During the depositions, the scattering of light caused by the growth of defects in the films was recorded with in situ total internal reflection microscopy. After deposition the films were analyzed by angle-resolved scatterometery, spectrophotometric measurement of film reflectance and transmittance, atomic force microscopy, and x-ray diffraction. We explore the effects of film defect formation on film optical properties and film surface topography using these data.
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