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Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition
Published on: August 29, 2017
Nonlinear absorption of thin Al2O3 films at 193 nm
1Laser-Laboratorium-Göttingen e.V., Hans-Adolf-Krebs-Weg 1, D-37077 Göttingen, Germany. oapel@llg.gwdg.de
Applied Optics
|March 18, 2008
Abstract:
Absorption of thin Al2O3 films was measured at 193 nm with an ArF-laser calorimeter. In addition to the expected high linear absorption coefficient, we found, for the first time to our knowledge, that two-photon absorption and transient color-center formation are nonnegligible loss channels in thin films at 193 nm. The nonlinear absorption coefficient is of the order of several times 10(-4) cm/W.
