Search research articles

ABOUT JoVE

Overview Leadership Blog JoVE Help Center

AUTHORS

Publishing Process Editorial Board Scope & Policies Peer Review FAQ Submit

LIBRARIANS

Testimonials Subscriptions Access Resources Library Advisory Board FAQ

RESEARCH

JoVE Journal Methods Collections JoVE Encyclopedia of Experiments Archive

EDUCATION

JoVE Core JoVE Business JoVE Science Education JoVE Lab Manual Faculty Resource Center Faculty Site

Terms & Conditions of Use

Related Concept Videos

Design Example: Measuring Distance Between Two Points with Obstructions

Design Example: Measuring Distance Between Two Points with Obstructions

When measuring distances in areas with physical obstructions, such as a lake in a field, surveyors must employ techniques to calculate accurate lengths without direct line measurements. One effective method is the offset technique, which allows for precise distance estimation over inaccessible stretches.In this scenario, a surveyor must measure a side of an area that crosses a lake. Since the measuring tape cannot span the lake, the surveyor begins by establishing a baseline that aligns with...

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by

Same author

[Application of target trail emulation in real world: a case study of effect of statins on mortality in diabetes patients].

Zhonghua liu xing bing xue za zhi = Zhonghua liuxingbingxue zazhi·2023

Same author

Effects of Accumulated Energy on Nanoparticle Formation in Pulsed-Laser Dewetting of AgCu Thin Films.

Nanoscale research letters·2021

Same author

Crystalline characteristics of annealed AlN films by pulsed laser treatment for solidly mounted resonator applications.

BMC chemistry·2019

Same author

[Effect of interleukin-7 on the anti-tumor function of CD8(+) T cells in patients with non-small cell lung cancer].

Zhonghua yi xue za zhi·2018

Same author

Effects of Laser Annealing Parameters on Optical and Electrical Properties of ITO/Metallic Glass Alloy Bi-layer Films.

Nanoscale research letters·2015

Same author

A protracted case of diarrhoea caused by Cryptosporidium in a non-immunocompromised patient.

Allergologia et immunopathologia·2013

Search research articles

Related Experiment Video

Updated: Jul 6, 2026

Radio Frequency Identification and Motion-sensitive Video Efficiently Automate Recording of Unrewarded Choice Behavior by Bumblebees

Radio Frequency Identification and Motion-sensitive Video Efficiently Automate Recording of Unrewarded Choice Behavior by Bumblebees

Published on: November 15, 2014

Focus measurement with a simple pattern design.

C Y Ku¹, T F Lei, H K Lin

¹Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan.

|March 22, 2008

Summary

This summary is machine-generated.

A novel bar-in-bar mask pattern accurately determines the best focus position for advanced lithographic tools. This method translates focal errors into measurable shifts, ensuring high precision and efficiency in semiconductor manufacturing.

More Related Videos

Using Rapid Serial Visual Presentation to Measure Set-Specific Capture, a Consequence of Distraction While Multitasking

Using Rapid Serial Visual Presentation to Measure Set-Specific Capture, a Consequence of Distraction While Multitasking

Published on: August 29, 2018

Control of Cell Geometry through Infrared Laser Assisted Micropatterning

Control of Cell Geometry through Infrared Laser Assisted Micropatterning

Published on: July 10, 2021

Related Experiment Videos

Last Updated: Jul 6, 2026

Radio Frequency Identification and Motion-sensitive Video Efficiently Automate Recording of Unrewarded Choice Behavior by Bumblebees

Radio Frequency Identification and Motion-sensitive Video Efficiently Automate Recording of Unrewarded Choice Behavior by Bumblebees

Published on: November 15, 2014

Using Rapid Serial Visual Presentation to Measure Set-Specific Capture, a Consequence of Distraction While Multitasking

Using Rapid Serial Visual Presentation to Measure Set-Specific Capture, a Consequence of Distraction While Multitasking

Published on: August 29, 2018

Control of Cell Geometry through Infrared Laser Assisted Micropatterning

Control of Cell Geometry through Infrared Laser Assisted Micropatterning

Published on: July 10, 2021

Area of Science:

Semiconductor Manufacturing
Optical Lithography
Metrology

Background:

Advanced lithographic tools demand precise focus determination due to diminishing depth of focus.
Ensuring accuracy and efficiency in lithography is critical for semiconductor yield.

Purpose of the Study:

To introduce a novel bar-in-bar mask pattern for accurate focus determination in lithography.
To translate focal errors into measurable shifts for precise focus evaluation.

Main Methods:

A bar-in-bar pattern is drawn on a conventional chrome binary mask.
Overlay measurement tools quantify center-to-center shifts of the bars caused by defocus.
A second-order polynomial equation is fitted to the shift data against best focus.

Main Results:

Defocus creates a symmetrical center-to-center shift, accurately described by a polynomial fit.
Differentiating the fitted equation yields a reliable focus value with <0.05 micrometer maximum error.
The technique demonstrates potential for evaluating tool aberrations like tilt, field curvature, and astigmatism.

Conclusions:

The proposed bar-in-bar method offers an accurate and efficient solution for focus determination in advanced lithography.
This technique provides a reliable metrology approach for ensuring lithographic process control.
The method's versatility extends to evaluating other critical optical parameters of lithographic tools.