Multiple-reflection effects in photoelastic stress analysis

A K Bhowmik1

  • 1Intel Corporation, 300 Enzo Drive, San Jose, California 95138, USA. achintya.k.bhowmik@intel.com

Applied Optics
|March 22, 2008
PubMed
Summary

Multiple internal reflections significantly alter photoelastic stress measurements using laser light. These effects modify fringe patterns, shifting and changing intensity profiles, especially with reflective samples.

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