Improved analyzer multilayers for aluminium and boron detection with x-ray fluorescence

Area of Science:

• Materials Science
• Analytical Chemistry
• Spectroscopy

Background:

• Accurate detection of elements like aluminium (Al) and boron (B) on silicon (Si) wafers is crucial for semiconductor manufacturing.
• Current wavelength-dispersive x-ray fluorescence (WDXRF) spectrometers rely on specific multilayer coatings for elemental analysis.

Purpose of the Study:

• To develop and evaluate novel multilayer coatings for enhanced detection limits of Al and B on Si wafers.
• To compare the performance of new multilayers against existing ones in WDXRF analysis.

Main Methods:

• Development of WSi(2)/Si, Ta/Si, and La/B(4)C multilayer structures.
• Testing these multilayers in WDXRF spectrometers for Al and B detection on Si wafers.

Main Results:

• WSi(2)/Si and Ta/Si multilayers achieved 42% and 60% better detection limits for Al, respectively, compared to W/Si.
• La/B(4)C multilayers improved the detection limit for B by approximately 28% compared to Mo/B(4)C.

Conclusions:

• The developed WSi(2)/Si, Ta/Si, and La/B(4)C multilayers offer superior performance for Al and B detection on Si wafers.
• These improved multilayers can enhance the sensitivity and accuracy of WDXRF analysis in semiconductor applications.