Photoresist characterization and linearization procedure for the gray-scale fabrication of diffractive optical...

Area of Science:

• Optics and Photonics
• Materials Science

Background:

• Diffractive optical elements (DOEs) are crucial for manipulating light.
• Accurate fabrication of surface-relief DOEs requires precise control over photoresist exposure.
• Existing methods for photoresist characterization may lack reliability for gray-scale applications.

Purpose of the Study:

• To develop a procedure for characterizing and linearizing photoresist response to ultraviolet (UV) exposure.
• To enable reliable gray-scale fabrication of diffractive optical elements.
• To present a simple and robust model for photoresist response.

Main Methods:

• Characterization of photoresist response to varying UV exposure doses.
• Development of a linearization model based on experimental data.
• Fabrication of surface-relief diffractive optical elements using the developed procedure.
• Comparison of experimental results with theoretical predictions.

Main Results:

• A reliable procedure for photoresist characterization and linearization was established.
• The developed model accurately describes the photoresist response.
• Successful gray-scale fabrication of surface-relief diffractive optical elements was demonstrated.
• Experimental results showed strong agreement with theoretical predictions.

Conclusions:

• The presented procedure and model are effective for gray-scale fabrication of DOEs.
• This work provides a foundation for advanced optical element design and manufacturing.
• The method enhances the precision and reliability of diffractive optical element fabrication.