Optimization of multilayer mirrors at 13.4 nm with more than two materials

The design of multilayer mirrors with more than two materials is one of the key technologies for investigating lithography. We study a new procedure for optimizing multilayer mirrors of different combinations of materials at a wavelength of 13.4 nm. By adding Be and C layers in different orders to a Si/Mo stack, we have observed enhancement of the reflectivity and a reduction in the number of layers. The Luus-Jaakola optimization procedure has been implemented for the global optimization of the multilayer mirrors. With this algorithm it is not necessary to specify initially the number of layers present in a given design.