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Updated: Jul 5, 2026

Fabrication and Optimization of Type II Silicon Clathrate Films
Published on: October 14, 2025
The first silicon-based cationic clathrate III with high thermal stability: Si172-xPxTey (x=2y, y>20)
Julia V Zaikina1, Kirill A Kovnir, Frank Haarmann
1Max-Planck-Institut für Chemische Physik fester Stoffe, Nöthnitzer Strabe 40, 01187 Dresden, Germany.
Abstract:
A new representative of a very rare clathrate III family, Si130P42Te21, has been synthesized from the elements. It crystallizes in the tetragonal space group P4(2)/mnm (no. 136) with the unit cell parameters a=19.2632(3) angstroms, c=10.0706(2) angstroms. Single crystal X-ray diffraction and solid state 31P NMR revealed a non-random distribution of phosphorus atoms over the framework positions. The crystal structure features a peculiar packing of large polyhedra Te@(Si/P)(n) never observed before for cationic clathrates. Despite the structural complexity, the composition of the novel clathrate Is in accordance with the Zintl rule, which was confirmed by a combination of optical metallography, scanning electron microscopy (SEM) and wavelength dispersive X-ray spectroscopy (WDXS), as well as by diamagnetic and semiconducting behavior of the synthesized phase. Clathrate Si130P42Te21 exhibits the highest reported thermal stability for this class of materials, it decomposes at 1510 K. This opens new perspectives for the creation of clathrate-based materials for high-temperature applications.
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