Comparison of the hybrid layer formed by Silorane adhesive, one-step self-etch and etch and rinse systems using

Ario Santini1, Vesna Miletic

  • 1The University of Edinburgh, Postgraduate Dental Institute, Lauriston Building (4th floor), Lauriston Place, Edinburgh EH3 9HA, United Kingdom. ariosantini@hotmail.com

Journal of Dentistry
|June 14, 2008
PubMed
Abstract