Direct fabrication of physical relief structures via patterned photodeposition of a titanium alkoxide solution

Ultraviolet (lambda=248 nm) excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of 100 microm wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to 310 nm for fluences of 12 and 192 J/cm(2), respectively. Moreover, the surface profile of the film surface at fluences greater than 12 J/cm(2) was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.