In-situ atomic force microscopy (AFM) imaging: influence of AFM probe geometry on diffusion to microscopic surfaces

The effect of AFM probe geometry on diffusion to micrometer-scale reactive (electrode) interfaces is considered. A disk-shaped substrate electrode was held at a potential to reduce a species of interest (aqueous Ru(NH 3) 6 (3+)) at a diffusion-controlled rate and the current response during AFM imaging provided information on local mass transport to the interface. This approach reveals how the AFM probe influences diffusion to a reactive surface, which is of importance in more clearly delineating the conditions under which in-situ AFM can be treated as a noninvasive probe of surface processes involving mass transport (e.g., electrode reactions and crystal dissolution and growth). An assessment has been made of three types of probes: V-shaped silicon nitride contact mode probes; single beam silicon probes; and batch-fabricated scanning electrochemical-atomic force microscopy (SECM-AFM) probes. Two disk electrodes, (6.1 microm and 1.6 microm diameter) have been considered as substrates. The results indicate that conventional V-shaped contact mode probes are the most invasive and that the batch-fabricated SECM-AFM probes are the least invasive to diffusion at both of the substrates used herein. The experimental data are complemented by the development of simulations based on a simple 2D model of the AFM probe and active surface site. The importance of probe parameters such as the cantilever size, tip cone height, and cone angle is discussed, and the implications of the results for studies in other areas, such as growth and dissolution processes, are considered briefly.