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Updated: Jul 4, 2026

Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Extreme-ultraviolet-induced oxidation of Mo/Si multilayers
Nicolas Benoit1, Sven Schröder, Sergiy Yulin
1Fraunhofer-Institut für Angewandte Optik und Feinmechanik, Jena, Germany.
Abstract:
The extreme-ultraviolet (EUV)-induced oxidation of Mo/Si multilayer mirrors was characterized by several methods: EUV reflectivity, x-ray photoelectron spectroscopy, small-angle x-ray reflectometry, atomic force microscopy, and EUV scattering measurements. Based on the results of the different investigation techniques, an oxidation model was developed to explain the degradation of the mirrors under EUV radiation.
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