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Updated: Jul 3, 2026

Identification of the Genes Involved in Stomatal Development via Epidermal Phenotype Scoring
Published on: January 20, 2023
Vein patterning screens and the defectively organized tributaries mutants in Arabidopsis thaliana
Jalean Joyanne Petricka1, Nicole Kho Clay1, Timothy Mark Nelson1
1Department of Molecular, Cellular, and Developmental Biology, Yale University, New Haven, CT 06520-8104, USABiology Department, Duke University, French Family Sciences Center, Durham, NC 27703, USABiology Department, Harvard University, Massachusetts General Hospital, Boston, MA 02114-2605, USA.
Abstract:
Leaf veins form a closed network that transports essential photosynthates, water and signaling molecules to the developing plant. The formation of the patterns of these networks during leaf ontogeny is an active subject of modeling and computer simulation. To investigate the vein patterning process, we performed screens for defects in juvenile leaf vein patterning in Arabidopsis thaliana lines subjected to mutagenesis via diepoxybutane, activation tagging or the Dissociation/Activator transposon. We identified over 40 vein pattern defective lines, providing a phenotypic resource for the testing of vein patterning models. In addition, we report the chromosomal linkage for 13 of these, eight of which were successfully cloned. We further describe the phenotypes of five of these mutants, which we call the defectively organized tributaries (dot) mutants, and their corresponding molecular identities. The diversity of the individual genes affected in this collection of pattern mutants suggests that vein pattern is highly sensitive to perturbations in many cellular processes. Despite this diversity of causes, the resulting pattern defects fall into a limited number of classes, including parallel, spurred, misaligned, open, midvein gap and irregularly spaced. These classes may represent sensitivities to cellular processes associated with the DOT genes. The ontogeny of common defective patterns should be accommodated into any robust model for the ontogeny and evolution of pattern.
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