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Maskless photolithography using UV LEDs.

Rosanne M Guijt1, Michael C Breadmore

  • 1Australian Centre for Research on Separation Science, Private Bag 75, Hobart, TAS 7001, Australia. Rosanne.Guijt@utas.edu.au

Lab on a Chip
|July 25, 2008
PubMed
Summary
This summary is machine-generated.

UV light emitting diodes (LEDs) offer a budget-friendly, high-resolution method for direct writing lithography. This technique enables rapid prototyping of features under 20 micrometers, ideal for microfluidic devices.

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Area of Science:

  • Optoelectronics
  • Microfabrication
  • Materials Science

Background:

  • Direct writing lithography is crucial for microfabrication.
  • Traditional lithography methods can be expensive and time-consuming.
  • Exploring cost-effective, high-resolution light sources is essential for rapid prototyping.

Purpose of the Study:

  • To evaluate the suitability of UV LEDs for direct writing lithography.
  • To demonstrate high-resolution patterning capabilities using UV LEDs.
  • To assess the potential for rapid prototyping of microfeatures.

Main Methods:

  • Collimation and focusing of a 372 nm UV LED output using optical components.
  • Substrate movement with a motorized linear stage for precise patterning.
  • Lithographic patterning of SU-8 and Ordyl SY 330 photoresists.
  • Fabrication of microfluidic devices using masters created by LED lithography.

Main Results:

  • Achieved line widths down to 35 micrometers in SU-8 at 80 micrometers/second.
  • Patterned features as narrow as 17 micrometers in Ordyl SY 330 at 245 micrometers/second.
  • Demonstrated rapid patterning, with a 75 mm feature created in 5 minutes.
  • Successfully fabricated functional microfluidic devices.

Conclusions:

  • UV LEDs are a viable and cost-effective light source for direct writing lithography.
  • The technique offers high resolution, suitable for features below 20 micrometers.
  • This method presents a promising alternative for rapid prototyping in microfabrication.