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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
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The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

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The molecular ion peak of a molecule in the mass spectrum provides vital information for molecular identification. However, conventional electron impact ionization can lead to the rapid dissociation of some molecular ions before they reach the detector. A milder ionization method is required to increase the lifetime of such ionized analyte molecules. Chemical ionization (CI) is a gas-phase protonation reaction useful for mass-analyzing analyte molecules that are easily protonated to yield the...

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Updated: Jul 2, 2026

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh
10:42

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Published on: May 3, 2019

Gas discharge ion source III. Modified Berkeley multifilament ion source.

R W Bickes1, F M Bacon, J B O'Hagan

  • 1Sandia Laboratories, Albuquerque, NM 87185, USA.

The Review of Scientific Instruments
|November 1, 1978
PubMed
Summary
This summary is machine-generated.

The modified Berkeley multifilament ion source (MFIS) produces high-current ion beams with low D(+) content and narrow energy distributions. This advanced ion source offers improved performance over older designs for various applications.

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Last Updated: Jul 2, 2026

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Published on: May 3, 2019

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Published on: August 1, 2017

Area of Science:

  • Plasma Physics
  • Ion Source Technology
  • Beam Generation

Background:

  • Ion sources are critical for applications requiring directed ion beams.
  • Previous ion source designs like duoplasmatrons have limitations in beam quality and impurity content.
  • The Berkeley multifilament ion source (MFIS) is a modified design aimed at improving ion beam characteristics.

Purpose of the Study:

  • To characterize the ion beams produced by a modified Berkeley multifilament ion source (MFIS).
  • To investigate the influence of source configuration, gas pressure, and operating conditions on beam properties.
  • To compare the performance of the MFIS with established ion source technologies.

Main Methods:

  • Measurements of total ion current, ion energy, mass distributions, and current density.
  • Analysis of impurity content within the ion beams.
  • Systematic variation of source configuration, gas pressure, and operating parameters.

Main Results:

  • The optimal MFIS configuration achieved ion beams exceeding 200 mA at pressures of 0.40–2.0 Pa.
  • MFIS beams exhibited significantly lower D(+) content (approx. 33%) compared to previous sources.
  • Narrower ion energy distributions and flatter current density profiles were observed.
  • Impurity levels were low (1%–2%), primarily consisting of masses 18, 20, and 22.

Conclusions:

  • The modified Berkeley multifilament ion source demonstrates superior performance in terms of beam current, energy spread, and current density uniformity.
  • The MFIS offers a significant advantage in reducing D(+) content, making it suitable for specific applications.
  • This ion source represents a notable advancement over duoplasmatron and duopigatron technologies for generating high-quality ion beams.