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Related Experiment Video

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A Stable Phantom Material for Optical and Acoustic Imaging

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X-ray reflectometer for optical efficiency and scatter measurements.

J M Reynolds¹, S A Fields, R L Holland

¹Space Sciences Laboratory, NASA/Marshall Space Flight Center, AL 35812, USA.

The Review of Scientific Instruments

|December 1, 1978

Summary

A new instrument measures x-ray reflection efficiency and scatter for optical samples. It achieves high resolution, enabling detailed characterization of materials like fused silica for advanced optics.

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Area of Science:

Optics and Materials Science
X-ray instrumentation and metrology

Background:

Accurate characterization of optical sample reflectivity and scatter is crucial for x-ray applications.
Existing methods may lack the precision required for advanced optical metrology at x-ray wavelengths.

Purpose of the Study:

To develop and validate a novel instrument for measuring x-ray reflection efficiency and scatter.
To characterize optical properties of fused silica samples using the developed reflectometer.

Main Methods:

An oil-free vacuum chamber reflectometer was designed to measure reflection efficiency and scatter.
Measurements were performed as a function of the angle of incidence for x-ray wavelengths (1.5–113 Å).
Instrument resolution was determined using least-squares smoothing of experimental data.

Main Results:

Reflection efficiency was measured for fused silica (flatness λ/10) at 8.34 Å and compared to theoretical data.
Scatter curves were obtained for direct and reflected x-ray beams.
The instrument demonstrated a full-width-at-half-maximum (FWHM) resolution of approximately 13 arc seconds.

Conclusions:

The developed instrument provides precise measurements of x-ray reflection efficiency and scatter.
The findings validate the instrument's capability for characterizing optical materials for x-ray applications.
High-resolution characterization is essential for the development of advanced x-ray optical components.