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Mass Analyzers: Common Types01:19

Mass Analyzers: Common Types

The quadrupole mass analyzer consists of four cylindrical metal rods arranged in a diamond carrying a DC voltage and a radio-frequency AC voltage. The motion of ions through the quadrupole depends on the field strength, causing only ions of a certain m/z to resonate successfully and strike the detector at a given field strength. Though the transmission rate for these analyzers is high, the exact elemental composition of the sample is not determined because of low resolution; however, they are...
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview01:19

Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview

In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then passed on to...
Tandem Mass Spectrometry01:21

Tandem Mass Spectrometry

Tandem mass spectrometry is a technique that uses multiple mass analyzers in series to obtain a higher selectivity and reduce chemical noise during analyte detection. Instruments with multiple analyzers separated by an interaction cell enable secondary fragmentation and selected study of the fragment ions.Secondary fragmentations occur in the interaction cell and can be induced by various factors. Fragmentation induced by collision with inert gases, such as N2, Ar, He, etc., is called...
Mass Spectrum: Interpretation01:24

Mass Spectrum: Interpretation

An unknown compound can be established by identifying the molecular ion peak in the mass spectrum. The molecular ion peak is often weak or absent due to the predominance of fragmentation in high-energy electron beams. In such cases, a soft-energy electron beam can be used to scan the spectrum to enhance the intensity of the molecular ion peak. Additionally, chemical ionization, field ionization, and desorption ionization spectra are used to obtain a relatively intense molecular ion peak.To...
Mass Analyzers: Overview01:13

Mass Analyzers: Overview

The mass analyzer is a crucial component of the mass spectrometer. In the ionization chamber, the vaporized sample is bombarded with a high-energy electron beam to generate a radical cation and further fragment into neutral molecules, radicals, and cations. A series of negatively charged accelerator plates accelerate the cations into the mass analyzer. The mass analyzer separates ions according to their mass-to-charge (m/z) ratios and then directs them to the detector. The common types of mass...
Mass Spectrometers01:16

Mass Spectrometers

This lesson details the instrumentation of a mass spectrometer—a physical instrument to perform mass spectrometry on analyte molecules and record the characteristic mass spectra. This is achieved via three chief functions:

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Related Experiment Video

Updated: Jul 2, 2026

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry
07:10

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry

Published on: April 29, 2020

Secondary ion quadrupole mass spectrometer for depth profiling--design and performance evaluation.

C W Magee1, W L Harrington, R E Honig

  • 1RCA Laboratories, Princeton, NJ 08540, USA.

The Review of Scientific Instruments
|April 1, 1978
PubMed
Summary

This study introduces a new secondary ion mass spectrometer for depth profiling, achieving high sensitivity and resolution for impurity analysis in silicon. The instrument enables precise detection of elements like Boron and Aluminum down to parts per million atomic levels.

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In Situ Characterization of Hydrated Proteins in Water by SALVI and ToF-SIMS
09:48

In Situ Characterization of Hydrated Proteins in Water by SALVI and ToF-SIMS

Published on: February 15, 2016

Related Experiment Videos

Last Updated: Jul 2, 2026

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry
07:10

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry

Published on: April 29, 2020

In Situ Characterization of Hydrated Proteins in Water by SALVI and ToF-SIMS
09:48

In Situ Characterization of Hydrated Proteins in Water by SALVI and ToF-SIMS

Published on: February 15, 2016

Area of Science:

  • Materials Science
  • Analytical Chemistry
  • Surface Science

Background:

  • Secondary Ion Mass Spectrometry (SIMS) is crucial for elemental analysis.
  • Depth profiling requires high sensitivity, resolution, and vacuum conditions.
  • Existing instruments face limitations in detecting trace impurities and minimizing molecular interferences.

Purpose of the Study:

  • To develop an advanced quadrupole-based SIMS instrument for high-performance depth profiling.
  • To achieve superior detection sensitivity, depth resolution, and abundance sensitivity.
  • To enable precise quantification of impurities in semiconductor materials.

Main Methods:

  • Utilized ultrahigh vacuum construction for reduced molecular interferences.
  • Employed a primary beam of 5-keV, mass-analyzed Argon-40 ions.
  • Incorporated a secondary ion extraction lens and spherical energy filter for enhanced sensitivity.
  • Implemented automated instrument control and data acquisition for multi-element profiling.

Main Results:

  • Achieved detection limits below one part per million atomic (ppma) for Boron and Aluminum in Silicon.
  • Obtained depth resolution comparable to commercial ion microprobes.
  • Demonstrated abundance sensitivity of five to six orders of magnitude.
  • Reduced molecular peaks (H, C, O) in the ultrahigh vacuum environment, enabling hydrogen detection below 10 ppma.

Conclusions:

  • The developed SIMS instrument offers exceptional performance for depth profiling of trace impurities.
  • The combination of UHV, high sputtering rate, and advanced optics enables high-precision elemental analysis.
  • The instrument is well-suited for semiconductor research and quality control applications.