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Mass Analyzers: Common Types

Mass Analyzers: Common Types

The quadrupole mass analyzer consists of four cylindrical metal rods arranged in a diamond carrying a DC voltage and a radio-frequency AC voltage. The motion of ions through the quadrupole depends on the field strength, causing only ions of a certain m/z to resonate successfully and strike the detector at a given field strength. Though the transmission rate for these analyzers is high, the exact elemental composition of the sample is not determined because of low resolution; however, they are...

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In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then passed on to...

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Tandem Mass Spectrometry

Tandem mass spectrometry is a technique that uses multiple mass analyzers in series to obtain a higher selectivity and reduce chemical noise during analyte detection. Instruments with multiple analyzers separated by an interaction cell enable secondary fragmentation and selected study of the fragment ions.Secondary fragmentations occur in the interaction cell and can be induced by various factors. Fragmentation induced by collision with inert gases, such as N2, Ar, He, etc., is called...

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Updated: Jul 2, 2026

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry

Published on: April 29, 2020

Secondary ion quadrupole mass spectrometer for depth profiling--design and performance evaluation.

C W Magee¹, W L Harrington, R E Honig

¹RCA Laboratories, Princeton, NJ 08540, USA.

The Review of Scientific Instruments

|April 1, 1978

Summary

This study introduces a new secondary ion mass spectrometer for depth profiling, achieving high sensitivity and resolution for impurity analysis in silicon. The instrument enables precise detection of elements like Boron and Aluminum down to parts per million atomic levels.

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3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry

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Area of Science:

Materials Science
Analytical Chemistry
Surface Science

Background:

Secondary Ion Mass Spectrometry (SIMS) is crucial for elemental analysis.
Depth profiling requires high sensitivity, resolution, and vacuum conditions.
Existing instruments face limitations in detecting trace impurities and minimizing molecular interferences.

Purpose of the Study:

To develop an advanced quadrupole-based SIMS instrument for high-performance depth profiling.
To achieve superior detection sensitivity, depth resolution, and abundance sensitivity.
To enable precise quantification of impurities in semiconductor materials.

Main Methods:

Utilized ultrahigh vacuum construction for reduced molecular interferences.
Employed a primary beam of 5-keV, mass-analyzed Argon-40 ions.
Incorporated a secondary ion extraction lens and spherical energy filter for enhanced sensitivity.
Implemented automated instrument control and data acquisition for multi-element profiling.

Main Results:

Achieved detection limits below one part per million atomic (ppma) for Boron and Aluminum in Silicon.
Obtained depth resolution comparable to commercial ion microprobes.
Demonstrated abundance sensitivity of five to six orders of magnitude.
Reduced molecular peaks (H, C, O) in the ultrahigh vacuum environment, enabling hydrogen detection below 10 ppma.

Conclusions:

The developed SIMS instrument offers exceptional performance for depth profiling of trace impurities.
The combination of UHV, high sputtering rate, and advanced optics enables high-precision elemental analysis.
The instrument is well-suited for semiconductor research and quality control applications.