Related Experiment Video
Updated: Jul 2, 2026

07:10
3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry
Published on: April 29, 2020
Secondary particle collection in ion implantation dose measurement
1Hughes Research Laboratories, 3011 Malibu Canyon Road, Malibu, CA 90265, USA.
The Review of Scientific Instruments
|May 1, 1978
Abstract:
The measurement of ion implantation doses in the presence of secondary ions and electrons emitted from the target is discussed. A circuit and electrode geometry for obtaining accurate ion beam current measurements in the presence of both positive and negative secondary particles is presented.
Related Concept Videos
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview
In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then passed on to...
Determination of Crystal Structures
In the late 1800s, the revelation that light extended beyond visible wavelengths led to the discovery of X-rays by Wilhelm Roentgen. Recognized as high-energy electromagnetic radiation with short wavelengths, X-rays prompted exploration into their interaction with crystals. Max von Laue proposed in 1912 that the periodic arrangement of atoms, ions, or molecules in crystals would cause them to diffract X-rays, a hypothesis confirmed through experiments with copper sulfate and zinc sulfide...
