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Related Experiment Video

Updated: Jul 2, 2026

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
09:24

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Published on: July 2, 2012

Polymer pen lithography.

Fengwei Huo1, Zijian Zheng, Gengfeng Zheng

  • 1Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208-3113, USA.

Science (New York, N.Y.)
|August 16, 2008
PubMed
Summary
This summary is machine-generated.

A novel polymer pen lithography technique enables low-cost, high-throughput patterning. This direct write method merges nanometer precision with large-area printing capabilities for diverse applications.

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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
09:45

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Published on: June 12, 2018

Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Traditional lithography methods face limitations in cost, throughput, and scalability.
  • Scanning probe lithography offers high resolution but often lacks large-area processing capabilities.

Purpose of the Study:

  • To introduce a low-cost, high-throughput scanning probe lithography method.
  • To combine the precision of dip-pen nanolithography with the scalability of contact printing.

Main Methods:

  • Utilizing a soft elastomeric tip array for direct ink delivery, termed polymer pen lithography.
  • Employing time and force-dependent ink delivery to control feature sizes across multiple length scales.
  • Implementing optically leveled arrays of up to 11 million pyramid-shaped pens for uniform pattern development.

Main Results:

  • Demonstrated a method merging nanometer feature size control with large-area printing.
  • Achieved the formation of features on nanometer, micrometer, and macroscopic length scales using a single tip array.
  • Enabled high-throughput patterning through the use of a large array of soft elastomeric tips.

Conclusions:

  • Polymer pen lithography presents a versatile and scalable approach for direct write patterning.
  • The method offers a cost-effective solution for fabricating nanoscale to macroscale features.
  • This technique holds potential for diverse applications requiring precise surface patterning.