Related Experiment Video
Updated: Jul 2, 2026

Synthesis of Esters Via a Greener Steglich Esterification in Acetonitrile
Published on: October 30, 2018
Recovery of nitric acid from waste etching solution using solvent extraction
Chang-Hoon Shin1, Ju-Yup Kim, Jun-Young Kim
1R&D Center, Daeil Development Co., Ltd., Ansan 425-836, Republic of Korea. shinch777@chol.com
This study presents an efficient solvent extraction method for recovering high-purity nitric acid from industrial waste. The process utilizes tributyl phosphate (TBP) and achieves excellent recovery rates, minimizing hazardous waste.
Area of Science:
- Chemical Engineering
- Environmental Chemistry
- Industrial Chemistry
Background:
- Semiconductor manufacturing generates waste streams containing valuable acids like nitric acid (HNO(3)) and hazardous components such as hydrofluoric acid (HF) and silicon (Si).
- Effective recovery of HNO(3) is crucial for economic viability and environmental sustainability in the wafer industry.
- Traditional methods may struggle with complex waste compositions and high concentrations of impurities.
Purpose of the Study:
- To develop and optimize a solvent extraction process for recovering high-purity nitric acid from a complex industrial waste stream generated during wafer manufacturing.
- To evaluate the effectiveness of tributyl phosphate (TBP) as an extractant for HNO(3) in the presence of acetic acid (HAc), HF, and Si.
- To demonstrate the feasibility of the developed process through continuous operation.
Main Methods:
- Solvent extraction using tributyl phosphate (TBP) as the extractant.
- Pre-treatment of the waste stream to remove silicon and hydrofluoric acid as sodium hexafluorosilicate (Na(2)SiF(6)).
- Optimization of extraction, scrubbing, and stripping stages using batch tests, followed by continuous operation in a multistage mixer-settler.
Main Results:
- Pre-treatment successfully removed over 99% of silicon and hydrofluoric acid.
- Optimized conditions involved four extraction stages (O:A ratio 3), four scrubbing stages (O:A ratio 5), and five stripping stages (O:A ratio 1.5).
- Continuous operation for 200 hours yielded pure nitric acid at a concentration of 235 g/L with 99.8% purity, despite the presence of acetic acid.
Conclusions:
- Solvent extraction with TBP is a highly effective method for recovering pure nitric acid from complex semiconductor industry waste streams.
- The developed pre-treatment and optimized extraction process significantly reduces hazardous waste and recovers a valuable chemical product.
- The process demonstrates technical and economic feasibility for industrial application in acid recovery and waste minimization.
Related Concept Videos
Extraction: Advanced Methods
Titration in Nonaqueous Solvents
Sample Preparation for Analysis: Advanced Techniques
Acid digestion with strong acids is commonly used to dissolve inorganic materials that are insoluble (do not dissolve) in water. This method can be useful for...
Preparation of Carboxylic Acids: Hydrolysis of Nitriles
Washing, Drying, and Ignition of Precipitates
Nitriles to Carboxylic Acids: Hydrolysis

