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Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used.
Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
Ellipses01:30

Ellipses

An ellipse is formed when a right circular cone is intersected by an inclined plane that does not cut through its base. This intersection yields a closed, symmetric curve characterized by distinctive geometric properties. Most notably, an ellipse is defined as the collection of all points in a plane for which the combined distances to two fixed points—called the foci—remain constant.The ellipse features two principal axes: the major and the minor axes. The major axis is the longest diameter,...
Eccentricity of an Ellipse01:27

Eccentricity of an Ellipse

An ellipse is a fundamental conic section defined by the constant sum of distances from any point on its curve to two fixed points, known as the foci. This geometric property can be physically demonstrated using a pencil, string, and two pins. By anchoring the string at both ends and maintaining it taut with a pencil, one can trace the outline of an ellipse.The shape and extent of the ellipse are determined by its eccentricity, e, defined as the ratio of the distance between the center and a...

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Related Experiment Video

Updated: May 24, 2026

Evanescent Field Based Photoacoustics: Optical Property Evaluation at Surfaces
10:21

Evanescent Field Based Photoacoustics: Optical Property Evaluation at Surfaces

Published on: July 26, 2016

Single-angle-of-incidence ellipsometry.

Y A Zaghloul1, A R M Zaghloul

  • 1Georgia Institute of Technology, School of Electrical and Computer Engineering, Atlanta, Georgia 30302, USA.

Applied Optics
|September 2, 2008
PubMed
Summary

Single angle-of-incidence (SAI) ellipsometry offers a complete characterization of film-substrate systems with just one measurement. An inverse genetic algorithm (IGA) significantly reduces computational effort and enhances accuracy for optical property determination.

Area of Science:

  • Materials Science
  • Optical Physics
  • Computational Modeling

Background:

  • Ellipsometry is a powerful optical technique for characterizing thin films and surfaces.
  • Traditional ellipsometry often requires multiple measurements and complex data analysis.
  • Complete characterization of film-substrate systems is crucial for various applications.

Purpose of the Study:

  • To introduce and validate single angle-of-incidence (SAI) ellipsometry for comprehensive film-substrate system identification.
  • To develop and apply an inverse genetic algorithm (IGA) for efficient and accurate optical property determination.
  • To demonstrate the computational efficiency and robustness of the SAI-IGA method.

Main Methods:

  • Utilizing single angle-of-incidence (SAI) ellipsometry to acquire the ellipsometric function rho.

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  • Developing an inverse genetic algorithm (IGA) based on physical conditions for system identification.
  • Implementing optimizations within the IGA to reduce computational load, such as excluding film thickness from the fitness function.

    • Main Results:

    • SAI ellipsometry with IGA can fully determine optical constants (N1, N2) and film thickness (d) from a single measurement.
    • Significant reduction in computational effort: from 20,000 to 69 calculations for transparent films, and 80,000 to 180 for absorbing films.
    • The IGA demonstrates resilience to random and systematic experimental errors, ensuring robust and accurate results.

    Conclusions:

    • SAI ellipsometry combined with IGA provides a highly efficient and accurate method for complete film-substrate characterization.
    • The developed IGA offers substantial computational savings, making it suitable for real-time applications.
    • The method is validated experimentally and proven to be robust, stable, and accurate for various film-substrate systems.