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Nano-scale three dimensional surface relief features using single exposure counterpropagating multiple evanescent

Vadakke Matham Murukeshan1, Jeun Kee Chua, Sia Kim Tan

  • 1School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore.

Optics Express
|September 6, 2008
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Summary

This study numerically investigates nano-scale 3-D feature fabrication using total internal reflection-multiple evanescent waves interference lithography (TIR-MEWIL). The technique shows potential for creating high-aspect-ratio periodic structures with sub-wavelength features.

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Area of Science:

  • Nanofabrication
  • Optical Lithography
  • Materials Science

Background:

  • Advanced nanofabrication techniques are crucial for developing next-generation electronic and photonic devices.
  • Sub-wavelength feature fabrication presents significant challenges in achieving high resolution and aspect ratios.

Purpose of the Study:

  • To numerically investigate the fabrication of nano-scale 3-D features using total internal reflection-multiple evanescent waves interference lithography (TIR-MEWIL).
  • To explore the potential of TIR-MEWIL for creating periodic surface relief features with sub-wavelength dimensions and high aspect ratios.

Main Methods:

  • Numerical simulation of interference patterns generated by multiple evanescent waves.
  • Utilizing a four-incident plane waves configuration with a 364nm illumination source.
  • Employing a modified cellular automata algorithm to simulate 3D photoresist profiles.

Main Results:

  • Demonstrated potential for fabricating periodic surface relief features with diameters as small as 0.08λ.
  • Achieved height-to-diameter aspect ratios as high as 10.
  • Showcased the sensitivity of interference patterns to polarization and phase of incident waves for tailored feature geometries.

Conclusions:

  • TIR-MEWIL is a promising technique for high-resolution, high-aspect-ratio nanofabrication.
  • The method allows for precise control over feature geometry through manipulation of incident wave parameters.
  • Numerical simulations provide valuable insights into optimizing the lithography process for nano-scale 3D feature fabrication.