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Updated: Jun 30, 2026

Fabrication of Silica Ultra High Quality Factor Microresonators
Published on: July 2, 2012
Accurate frequency alignment in fabrication of high-order microring-resonator filters
Jie Sun1, Charles W Holzwarth, Marcus Dahlem
1Research Laboratory of Electronics, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA. sunjie@mit.edu
Abstract:
Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6 GHz to 0.28 GHz.
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