New matrix polymers for photo-activated resin composites using di-alpha-fluoroacrylic acid derivatives

A novel matrix resin for photo-activated resin composites was developed using alpha-fluoroacrylic acid derivatives. To render resin composites with improved mechanical properties, silica fillers were also used. It was found that the newly developed fluorine-substituted monomer was polymerized quite easily not only by free radical chemical initiators, but also by photoirradiation using free radical photoinitiator system. In particular, the photopolymerization rate of the novel monomer was more than two times faster than that of corresponding methacrylate-based monomer. Composite based on the newly developed matrix resin had higher micro-Vickers hardness and compressive strength values than the methacrylate-based composite, and that it contained only trace residual monomers compared with the methacrylate-based material. The high polymerization conversion of the fluorine-substituted monomer could be attributed to the polar effect or the small steric hindrance of fluorine at the alpha-position.