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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
Published on: March 20, 2019
New masking procedure for selective complexometric determination of copper(II)
1Department of Chemistry, Panjabi University, Patiala, India.
Talanta
|November 1, 1972
Summary
A novel masking procedure enables selective complexometric determination of copper(II) by decomposing the copper-EDTA complex. This method allows for accurate copper analysis even in the presence of various interfering metal ions.
Area of Science:
- Analytical Chemistry
- Inorganic Chemistry
Background:
- Complexometric titrations are widely used for metal ion quantification.
- Accurate determination of copper(II) can be challenging due to interference from other metal ions.
Purpose of the Study:
- To develop a highly selective masking procedure for the complexometric determination of copper(II).
- To investigate the efficacy of ternary masking mixtures for copper(II) analysis.
Main Methods:
- A new masking procedure based on the decomposition of the copper-EDTA complex at pH 5-6.
- Utilized ternary masking mixtures containing thiourea, ascorbic acid, and thiosemicarbazide (or phenanthroline/dipyridyl).
- Employed back-titration of excess EDTA with lead or zinc nitrate using Xylenol Orange indicator.
Main Results:
- The developed masking procedure demonstrated high selectivity for copper(II).
- The method effectively masked interfering cations including Ag(+), Hg(2+), Pb(2+), Ni(2+), Bi(3+), As(3+), Al(3+), Sb(3+), Sn(4+), Cd(2+), Co(2+), Cr(3+), Fe(3+), and Mn(2+).
- Consecutive determination of Hg(2+) and Cu(2+) was successfully achieved in the presence of other cations.
Conclusions:
- The new masking procedure offers a reliable and selective method for copper(II) determination.
- This technique simplifies the analysis of copper in complex matrices.
- The ability to perform consecutive determinations of Hg(2+) and Cu(2+) is a significant advancement.
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