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Updated: Jun 28, 2026

Emission Spectroscopic Boundary Layer Investigation during Ablative Material Testing in Plasmatron
Published on: June 9, 2016
Plasma emission sources in analytical spectroscopy-III.
S Greenfield1, H M McGeachin, P B Smith
1Albright and Wilson Ltd, P.O. Box 80, Oldbury, Warley, West Midlands, B694LN, England.
This study reviews inductively coupled plasma sources, detailing their development and properties. It explores their use in spectrochemical analysis and compares them to alternative plasma sources.
Area of Science:
- Analytical Chemistry
- Plasma Physics
Background:
- Inductively coupled plasma (ICP) sources are crucial for modern analytical techniques.
- Understanding ICP source development is key to advancing spectrochemical analysis.
Purpose of the Study:
- To discuss the development and properties of ICP sources.
- To review ICP applications in spectrochemical analysis.
- To compare ICP sources with other plasma sources.
Main Methods:
- Literature review of ICP source development.
- Analysis of ICP properties relevant to spectroscopy.
- Comparative study of different plasma source types.
Main Results:
- ICP sources offer distinct advantages in spectrochemical analysis due to their properties.
- Specific applications of ICP in elemental and isotopic analysis are highlighted.
- ICP sources demonstrate superior performance compared to certain alternative plasma technologies.
Conclusions:
- ICP sources are versatile and powerful tools for spectrochemical analysis.
- The properties of ICP sources make them suitable for a wide range of analytical challenges.
- Further research into ICP source optimization can enhance analytical capabilities.
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