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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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Spectrophotometric determination of the oxygen to uranium ratio in uranium oxides based on dissolution in sulphuric

B N Murty1, R B Yadav, C K Ramamurthy

  • 1Control Laboratory, Nuclear Fuel Complex, Hyderabad, India.

Talanta
|November 1, 1991
PubMed

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