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Updated: Jun 28, 2026

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
Published on: July 2, 2012
Simonetta Grilli1, Veronica Vespini, Pietro Ferraro
1Istituto Nazionale di Ottica Applicata del CNR, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy. simonetta.grilli@inoa.it
Directly pattern polydimethylsiloxane (PDMS) films by controlling substrate wettability using the pyroelectric effect. This method enables the creation of microbump arrays on functionalized crystals for advanced material applications.
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