Related Experiment Video
Updated: Jun 27, 2026
12:08
Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System
Published on: July 18, 2015
Chip-scale dispersion engineering using chirped vertical gratings
D T H Tan1, K Ikeda, R E Saperstein
1Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, CA 92093-0409, USA. thtan@ucsd.edu
Optics Letters
|December 17, 2008
Summary
This study demonstrates a silicon photonic device with tunable dispersion for optical applications. Chirped Bragg gratings offer engineered group-velocity dispersion up to 7.0 x 10^5 ps/nm/km.
Area of Science:
- Photonics
- Materials Science
- Optical Engineering
Background:
- Silicon photonics enables advanced optical devices.
- Chirped Bragg gratings are crucial for dispersion engineering.
Purpose of the Study:
- To design, fabricate, and characterize a strongly coupled, chirped Bragg grating in silicon.
- To engineer group-velocity dispersion for photonic applications.
Main Methods:
- Sinusoidal modulation of silicon waveguide sidewalls.
- Fabrication and experimental characterization of the Bragg grating.
- Asymmetric Blackman apodization for bandwidth and ripple control.
Main Results:
- Demonstrated tunable operating wavelength and device bandwidth.
- Achieved engineered group-velocity dispersion (normal or anomalous).
- Obtained dispersion values up to 7.0 x 10^5 ps/nm/km at 1.55 microm.
Conclusions:
- The chirped Bragg grating offers versatile dispersion engineering in silicon photonics.
- Asymmetric Blackman apodization is optimal for maximizing bandwidth and suppressing ripples.
- The device is suitable for various photonic applications requiring precise dispersion control.
