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Updated: Jun 26, 2026

Synthesis and Characterization of Self-Assembled Metal-Organic Framework Monolayers Using Polymer-Coated Particles
Published on: June 14, 2024
Atomic layer deposition of aluminum oxide on carboxylic acid-terminated self-assembled monolayers
Meng Li1, Min Dai, Yves J Chabal
1Department of Physics and Astronomy, Rutgers University, Piscataway, New Jersey 08854, USA.
Abstract:
In situ infrared absorption spectroscopy is used to monitor atomic layer deposition (ALD) of aluminum oxide (Al2O3) on carboxylic acid-terminated self-assembled monolayers (SAMs), Si(111)-(CH2)10-COOH (or COOH-SAMs), directly grafted on silicon (111) at approximately 100 degrees C. The quality of resulting Al2O3 films is comparable to Al2O3 on SiO2. Both the SAM film and the Si/SAM interface remain chemically stable during growth and upon post annealing to 400 degrees C, suggesting that the tight packing of the alkyl chains and COOH-SAM head groups presents a diffusion barrier and promotes ordered nucleation for ALD.
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