Fabrication and characterization of positive and negative copper sulfide micropatterns on self-assembled monolayers

Positive and negative micropatterned copper sulfide thin films were successfully fabricated through chemical bath deposition methods. The thin films were deposited on patterned Si substrates with two different self-assembled monolayers (SAMs), i.e., NH(2)/CH(3) and NH(2)/OH terminated silane, respectively. Under an optimal depositing condition, the copper sulfide thin films were selectively deposited on NH(2) regions. The resultant Cu(2)S crystal films, in positive and negative circle patterns, respectively, were verified by SEM, XPS, XRD spectra. UV-vis spectrum analysis demonstrated that the prepared Cu(2)S films exhibited high optical transmission in the visible light regions (vis) and near-infrared region (NIR), and a low band gap of 2.48 eV.