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Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination

F Brizuela1, Y Wang, C A Brewer

  • 1National Science Foundation Engineering Research Center for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO 80523, USA. brizuela@engr.colostate.edu

Optics Letters
|February 3, 2009
PubMed

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