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Low loss high index contrast nanoimprinted polysiloxane waveguides
Ting Han1, Steve Madden, Mathew Zhang
1Laser Physics Center, Australian National University, ACT 0200, Australia. tih111@rsphysse.anu.edu.au
Optics Express
|February 17, 2009
Summary
Nanoimprint lithography fabricates low-cost, high-resolution photonic devices. This study demonstrates its first-time use for creating low-loss, broadband waveguides in polysiloxane for advanced optical applications.
Area of Science:
- Nanotechnology
- Materials Science
- Photonics
Background:
- Nanoimprint lithography offers simplicity, high resolution, and low cost, making it suitable for microelectronics and microfluidics.
- Cost is a significant barrier to the widespread adoption of photonic devices in high-volume applications.
Purpose of the Study:
- To report the first-time use of nanoimprint technology for fabricating waveguides.
- To develop low-loss, broadband, high-index contrast waveguides using nanoimprint lithography.
Main Methods:
- Utilized nanoimprint lithography for waveguide fabrication.
- Employed a Polysiloxane polymer system for creating optical structures.
Main Results:
- Successfully fabricated waveguides using nanoimprint technology.
- Achieved low optical loss and broadband operation in the fabricated waveguides.
- Demonstrated high-index contrast in the polysiloxane waveguides.
Conclusions:
- Nanoimprint technology is a viable and cost-effective method for fabricating advanced photonic devices.
- The developed polysiloxane waveguides show promise for various high-volume photonic applications.
- This work opens new avenues for low-cost manufacturing in integrated photonics.
