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Updated: Jun 25, 2026

Fabrication of Low Temperature Carbon Nanotube Vertical Interconnects Compatible with Semiconductor Technology
Published on: December 7, 2015
Negative differential resistance: gate controlled and photoconductance enhancement in carbon nanotube intraconnects
1Department of Electrical and Computer Engineering, Electronic Imaging Center at NJIT, New Jersey Institute of Technology, Newark, New Jersey 07102, USA.
Abstract:
Intraconnects, as-grown single-walled carbon nanotubes bridging two metal electrodes, were investigated as gated structures. We show that even with a seemingly "ohmic" contact at zero gate voltage one observes negative differential resistance (NDR) at nonzero gate bias. Large differential photo conductance (DPC) was associated with the NDR effect raising hopes for the fabrication of novel high-speed optoelectronic devices.
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