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Self-sputtering far above the runaway threshold: an extraordinary metal-ion generator
Joakim Andersson1, André Anders
1Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.
Physical Review Letters
|March 5, 2009
Summary
Energetic electrons create excess plasma in self-sputtering systems, enabling prolific metal ion generation. This process allows ion current to substrates to surpass discharge current, especially in gasless copper sputtering.
Area of Science:
- Plasma Physics
- Materials Science
- Ion Source Technology
Background:
- Self-sputtering generates energetic electrons above the runaway threshold voltage.
- These electrons can create 'excess plasma' in zones remote from the magnetron target.
Purpose of the Study:
- To investigate the generation of usable metal ions through excess plasma formation.
- To analyze the relationship between discharge voltage and ion current in gasless self-sputtering.
Main Methods:
- Utilizing ionization balance considerations to explain energy transfer to remote plasma zones.
- Experimenting with gasless self-sputtering of copper.
Main Results:
- Energetic secondary electrons provide energy for ionization in remote plasma zones.
- The ion current delivered to a substrate can exceed the discharge current.
- For gasless copper sputtering, usable ion current exhibits exponential scaling with discharge voltage.
Conclusions:
- Self-sputtering systems driven above the runaway threshold are highly efficient metal ion generators.
- This method offers a novel approach for high-flux ion beam generation, exceeding conventional limits.
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