Fabrication of periodic nanovein structures by holography lithography technique

This work demonstrates a promising method to fabricate periodic nanovein structures, which can be served as templates for fabricating photonic crystals possessing a large complete photonic bandgap. First, the fabrication of a one-dimensional grating structure connected with nanolines is demonstrated by controlling the exposure dosage of the second exposure of the two-exposure two-beam interference technique. Secondly, by using the same interference technique but setting each exposure under the same exposure dosage, two-dimensional periodic structures with nanovein connections were fabricated. These structures were obtained by using either a pure negative photoresist with very low concentration of photoinitiator or a mixing of a negative and a positive photoresists. The fabricated structures are not, as usual, a duplication of the interference pattern but are constituted by square or triangular rods connecting with narrow veins. They can be used as templates for fabricating photonic crystals with very large complete photonic bandgap.