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Updated: Jun 25, 2026

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Numerical analysis of resonant and lasing properties at a defect region within a random structure
Hideki Fujiwara1, Yosuke Hamabata, Keiji Sasaki
1Research Institute for Electronic Science, Hokkaido University, Sapporo, 001-0020, Japan. fuji@es.hokudai.ac.jp
Abstract:
We propose a simple structure for manipulating resonant conditions in random structures, in which a "defect" region where no scatterer is set is deliberately made in the structure. By employing a two-dimensional finite-difference time-domain method including rate equations, we examine the resonant and lasing properties observed at the defect region by changing the filling factor of scatterers. From the numerical results, we confirm that an distinct localized spot at the defect can be realized by determining an optimal filling factor and scatterer size and selecting the appropriate defect size.
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