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Updated: Jun 25, 2026

Implementation of a Reference Interferometer for Nanodetection

Implementation of a Reference Interferometer for Nanodetection

Published on: April 26, 2014

Nanoscale defect detection by heterodyne interferometry.

Haoshan Lin¹, Yuhe Li, Dongsheng Wang

¹State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrumentsand Mechanology, Tsinghua University, Beijing 100084, China. gllinhs2004@yahoo.com.cn

|March 12, 2009

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This study introduces a new instrument for measuring nanoscale defects using heterodyne interferometry. The system demonstrates high accuracy and repeatability for defect characterization, offering a stable 0.5 nm measurement capability.

Area of Science:

Nanotechnology
Optical Metrology
Surface Science

Background:

Accurate characterization of nanoscale defects is crucial for advanced material development.
Existing methods for defect measurement may lack the required precision or range.
Scanning probe techniques offer high resolution but can be limited in speed or environmental adaptability.

Purpose of the Study:

To develop and validate a novel instrument for precise nanoscale defect measurement.
To investigate the performance characteristics of the developed system, including sensitivity and stability.
To demonstrate the system's capability in characterizing standard samples with nanoscale features.

Main Methods:

Construction of an instrument based on heterodyne interferometry with phase measurement.

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Last Updated: Jun 25, 2026

Implementation of a Reference Interferometer for Nanodetection

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Published on: April 26, 2014

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Utilization of a polarizing beam splitter for signal generation.

Employing an oscillating cantilever tip as a scanning probe for topography acquisition.

Experimental investigation of tip displacement dependence on tip-sample distance variations.

Comb scanning methodology for sample topography analysis.

Main Results:

Experimental validation confirmed that tip displacement increases and is detectable as the sample is approached.
The instrument successfully measured the pitch of a standard sample, demonstrating defect characterization capability.
The heterodyne interferometry system exhibited excellent repeatability and a wide measurement range.
High accuracy was achieved, with a demonstrated measurement stability of 0.5 nm.

Conclusions:

The developed heterodyne interferometry instrument is effective for nanoscale defect measurement.
The system offers significant advantages in terms of accuracy, repeatability, and measurement range.
This technology holds potential for advanced surface analysis and quality control in nanotechnology applications.