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Related Concept Videos

Lossless Lines01:23

Lossless Lines

In electrical engineering, a lossless transmission line is characterized by a purely imaginary propagation constant and a resistive characteristic impedance. The ABCD parameters, which describe the relationship between the input and output voltages and currents, indicate an equivalent π circuit with an imaginary series impedance and a shunt admittance. This results in a transmission line that, when the product of the phase constant (beta) and the length of the line is less than pi, exhibits...

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Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities
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Low loss etchless silicon photonic waveguides.

Jaime Cardenas1, Carl B Poitras, Jacob T Robinson

  • 1Department of Electrical and Computer Engineering, Cornell University, Ithaca, NY, USA.

Optics Express
|March 19, 2009
PubMed
Summary

We developed new silicon waveguides using selective oxidation, achieving ultra-smooth surfaces and minimal propagation loss. This fabrication method significantly reduces signal loss in optical devices.

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Area of Science:

  • Photonics
  • Materials Science
  • Nanotechnology

Background:

  • Silicon photonics is crucial for integrated optical circuits.
  • Traditional fabrication methods often introduce surface roughness, increasing signal loss.
  • Achieving ultra-smooth surfaces is key to low-loss waveguides.

Purpose of the Study:

  • To demonstrate a novel fabrication technique for silicon waveguides without etching.
  • To characterize the optical properties, specifically propagation and bending loss, of these waveguides.
  • To highlight the potential of selective oxidation for advanced photonic integrated circuits.

Main Methods:

  • Waveguide definition using selective oxidation of silicon.
  • Characterization of sidewall smoothness using atomic force microscopy (implied).
  • Measurement of propagation loss at 1.55 micrometers.
  • Measurement of bending loss for 90-degree bends with a 50-micrometer radius.

Main Results:

  • Fabrication of silicon waveguides without any silicon etching.
  • Achieved ultra-smooth sidewalls with width variations of only 0.3 nm.
  • Demonstrated a low propagation loss of 0.3 dB/cm at 1.55 micrometers.
  • Observed low bending loss of approximately 0.007 dB/bend for a 90-degree bend.

Conclusions:

  • Selective oxidation is an effective method for fabricating ultra-smooth silicon waveguides.
  • The demonstrated waveguides exhibit excellent low-loss characteristics, suitable for integrated photonics.
  • This technique offers a promising alternative for manufacturing high-performance silicon photonic devices.